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Harrick Plasma 
Harrick Plasma公司的等離子清洗器是一種小型化、非破壞性的超清洗設備。等離子清洗器采用氣體作為清洗介質，有效地避免了因液體清洗介質對被清洗物帶來的二次污染。等離子清洗器外接一臺真空泵，工作時清洗腔中的等離子體輕柔沖刷被清洗物的表面，短時間的清洗就可以使有機污染物被徹底地清洗掉，同時污染物被真空泵抽走，其清洗程度達到分子級。等離子清洗器除了具有超清洗功能外，在特定條件下還可根據(jù)需要改變某些材料表面的性能，等離子體作用于材料表面，使表面分子的化學鍵發(fā)生重組，形成新的表面特性。對某些有特殊用途的材料，在超清洗過程中等離子清洗器的輝光放電不但加強了這些材料的粘附性、相容性和浸潤性，并可消毒和殺菌。等離子清洗器廣泛應用于光學、光電子學、電子學、材料科學、生命科學、高分子科學、生物醫(yī)學、微觀流體學等領域。
Harrick Plasma, formerly known as Harrick Scientific, is a leading supplier of plasma equipment to the research community. We have been providing quality, low-cost, tabletop plasma devices specifically designed for laboratory, R&D and office use for over 30 years.

Harrick Plasma, formerly known as Harrick Scientific, has historically specialized in the design and manufacture of instruments for optical spectroscopy. Since its beginnings in 1969, Harrick Scientific has enjoyed a long reputation of advancing the frontiers of optical spectroscopy through its innovations to transmission, internal reflection, external reflection, diffuse reflection, and emission spectroscopy. The president and founder of the corporation, Dr. N. J. Harrick, pioneered internal reflection spectroscopy and became the principal developer of this technique.

Harrick Scientific was one of the first companies to pioneer the manufacture of benchtop research plasma devices more than thirty years ago. Although originally conceived for surface cleaning in optical spectroscopy and general optics, Harrick Scientific's plasma devices have found service in a wide variety of applications and in numerous technical fields. Our plasma devices are common in many research labs, and have been referenced in over 300 peer-reviewed papers and in more than 60 patents.

Harrick Plasma is located in Ithaca, New York. In our renewed focus, we look forward to continuing in our innovation of the use of plasma technology to meet the diverse surface treatment needs of the research community.